In-situ Monitoring of Optical Near-Field Material Processing by Electron Microscopes

David J. Hwang,Bin Xiang,Sang-Gil Ryu,Oscar Dubon,Andrew M. Minor,Costas P. Grigoropoulos
DOI: https://doi.org/10.1007/s00339-011-6615-6
2011-01-01
Abstract:Lasers are efficient tools in a variety of micro/nanoscale material processing applications. Even though optical imaging techniques offer convenient in-situ monitoring, their spatial resolution is frequently not sufficient for inspecting the detailed phenomena occurring in micro/nano structures, hence requiring additional characterization tools. Besides the inconvenience, critical processing parameters cannot be readily determined ex situ. In this study, an example of an in-situ monitoring technique for micro/nanoscale laser processing is demonstrated by combining the optical near-field apparatus with a scanning electron microscopy (SEM). In-situ process monitoring under true optical near-field configuration is realized through orthogonal probe manipulation and combined probe-sample translation and tilting apparatus. Catalyst behavior under a chemical vapor deposition (CVD) gas environment coupled with near-field illumination is monitored in an environmental SEM.
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