Abstract:The fabrication of large-area and flexible nanostructures currently presents various challenges related to the special requirements for 3D multilayer nanostructures, ultrasmall nanogaps, and size-controlled nanomeshes. To overcome these rigorous challenges, a simple method for fabricating wafer-scale, ultrasmall nanogaps on a flexible substrate using a temperature above the glass transition temperature (<i>T</i>g) of the substrate and by layer-by-layer nanoimprinting is proposed here. The size of the nanogaps can be easily controlled by adjusting the pressure, heating time, and heating temperature. In addition, 3D multilayer nanostructures and nanocomposites with 2, 3, 5, 7, and 20 layers were fabricated using this method. The fabricated nanogaps with sizes ranging from approximately 1 to 40 nm were observed via high-resolution transmission electron microscopy (HRTEM). The multilayered nanostructures were evaluated using focused ion beam (FIB) technology. Compared with conventional methods, our method could not only easily control the size of the nanogaps on the flexible large-area substrate but could also achieve fast, simple, and cost-effective fabrication of 3D multilayer nanostructures and nanocomposites without any post-treatment. Moreover, a transparent electrode and nanoheater were fabricated and evaluated. Finally, surface-enhanced Raman scattering substrates with different nanogaps were evaluated using rhodamine 6G. In conclusion, it is believed that the proposed method can solve the problems related to the high requirements of nanofabrication and can be applied in the detection of small molecules and for manufacturing flexible electronics and soft actuators.

Fabrication of Reproducible Sub-5 Nm Nanogaps by a Focused Ion Beam and Observation of Fowler-Nordheim Tunneling

Fabrication of Sub-10 Nm Gap by Using Electron Beam Lithography

Self-marked preparation of site-specific transmission electron microscope lamellae of nanodevices using focusing ion beam technique.

Precise Fabrication of Uniform Molecular Gaps for Active Nanoscale Devices

Electrochemical Approach for Fabricating Nanogap Electrodes with Well Controllable Separation

Fabricating Atom-Sized Gaps by Field-Aided Atom Migration in Nanoscale Junctions

Fabrication of A Nano-Scale Gap by Selective Chemical Deposition

Sub-5 nm nanogap electrodes towards single-molecular biosensing

Lithography-Independent and Large Scale Fabrication of A Metal Electrode Nanogap

Fabrication of Controllably Variable Sub-100 Nm Gaps in Silver Nanowires by Photothermal-Induced Stress.

High-yield fabrication of nm-size gaps in monolayer CVD graphene.

Fabrication of nanometer-spaced electrodes using gold nanoparticles

Wafer-scale nanofabrication of sub-5 nm gaps in plasmonic metasurfaces

Large-Area Nanogap-Controlled 3D Nanoarchitectures Fabricated via Layer-by-Layer Nanoimprint

Nanomanufacturing of Graphene Nanosheets Through Nano-Hole Opening and Closing

Electrochemical Etching-Assisted Fabrication of Quantum Tunneling Sensing Probes with Controlled Nanogap Width

Molecular crystal lithography: a facile and low-cost approach to fabricate nanogap electrodes.

Self-aligned Split Gate Electrodes Fabricated on Suspended Carbon Nanotubes

Quantized Tunneling Current in the Metallic Nanogaps Formed by Electrodeposition and Etching

Controllable fabrication of Sub-20nm structures with coupling field tip enhancement effect induced by nanosecond pulsed laser irradiation

Self-aligned Nanolithography in a Nanogap.