Abstract:Laser-induced damage on fused silica optics remains a major issue that limits the promotion of energy output of large laser systems. Subsurface impurity defects inevitably introduced in the practical polishing process incur strong thermal absorption for incident lasers, seriously lowering the laser-induced damage threshold (LIDT). Here, we simulate the temperature and thermal stress distributions involved in the laser irradiation process to investigate the effect of impurity defects on laser damage resistance. Then, HF-based etchants (HF:NH4F) are applied to remove the subsurface impurity defects and the surface quality, impurity contents and laser damage resistance of etched silica surfaces are tested. The results indicate that the presence of impurity defects could induce a dramatic rise of local temperature and thermal stress. The maximum temperature and stress can reach up to 7073 K and 8739 MPa, respectively, far higher than the melting point and compressive strength of fused silica, resulting in serious laser damage. The effect of impurity defects on laser damage resistance is dependent on the species, size and spatial location of the defects, and CeO2 defects play a dominant role in lowering the LIDT, followed by Fe and Al defects. CeO2 defects with radius of 0.3 μm, which reside 0.15 μm beneath the surface, are the most dangerous defects for incurring laser damage. By HF acid etching, the negative effect of impurity defects on laser damage resistance could be effectively mitigated. It is validated that with HF acid etching, the number of dangerous CeO2 defects is decreased by more than half, and the LIDT could be improved to 27.1 J/cm2.

Origin and Distribution of Redeposition Layer in Polished Fused Silica

Effect of Chemical Activity of Bulk and Pad Materials on the Redeposition Layer During Polishing of Glass

Research on the mitigation of redeposition defects on the fused silica surface during wet etching process

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Evolution of physical and mechanical properties of fused silica after subsurface damage layer removal by RIE treatment

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

Formation Mechanism of a Smooth, Defect-Free Surface of Fused Silica Optics Using Rapid CO2 Laser Polishing

Spatial Sputtering of Fused Silica after a Laser-Induced Exploding Caused by a 355 Nm Nd: YAG Laser

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

Towards Investigating Surface Quality of Single-Crystal Silicon Optics Polished with Different Processes

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Damage Behaviors of Silica Microparticles on Fused Silica Optics under 355 Nm High Fluence Laser

Achieving Ultralow Surface Roughness and High Material Removal Rate in Fused Silica Via a Novel Acid SiO2 Slurry and Its Chemical-Mechanical Polishing Mechanism

Investigation on morphology and chemistry of the Beilby layer on polished fused silica

Damage Morphologies of Al2O3 and Fe Particles Attached on the Input Surface of Fused Silica after Irradiation by a 355 Nm Laser.

Morphology evolution mechanisms and localized structural modification of repaired sites on fused silica optics processed by CO2 laser rapid ablation mitigation

The Deterioration Characteristics and Mechanism of Polishing Pads in Chemical Mechanical Polishing of Fused Silica

Incident Laser Modulation of a Repaired Damage Site with a Rim in Fused Silica Rear Subsurface

Research on Laser-Induced Damage Post-Restoration Morphology of Fused Silica and Optimization of Patterned CO2 Laser Repair Strategy

Investigation of the Multimechanism Laser Cleaning Dynamics for Rough Fused Silica Surfaces with Organic Contaminants: A Computational Simulation and Atomic Analysis.

Ab Initio Molecular Dynamics Simulation of the Effect of Impurities on Laser-Induced Damage of Fused Silica