EVIDENCE OF POLARIZATION SWITCHING INDUCED BY MAGNETIC FIELD IN BiFeO3 THIN FILM

J. N. Wang,W. L. Li,X. L. Li,W. D. Fei
DOI: https://doi.org/10.1142/s0217984913500772
2013-01-01
Modern Physics Letters B
Abstract:A BiFeO 3 thin film was prepared on the (111) Pt / Ti / SiO 2/ Si substrate by the solution coating method. In order to detect the effect of an external magnetic field on the BiFeO 3 thin film, a fine scan X-ray diffraction with a scan ratio of 0.002°/s was carried out under the magnetic field parallel to the film surface. The result of the in situ analysis of X-ray diffraction for the thin film in the magnetic field indicates that the magnetic field leads to an increase of the integral intensity ratio of [Formula: see text] compared with that under no magnetic field. The increase of [Formula: see text] implies a domain switching under the magnetic field, where the domain switching comes from the decreasing residual tensile stress induced by the magnetostriction of BiFeO 3 in the magnetic field.
What problem does this paper attempt to address?