Abstract:Among the many ferroelectric film fabrication techniques, the sol-gel process provides high purity, large deposition area and easy composition control. However, the thickness limit of a crack-free single-layer film is about 0.2 mum and about 10 times of coating and thermal treatment processing are needed to deposit 1.5 mum-thick films. In laser ablation, the deposition rate is expected to be 1-2 mum/h, but the film quality is lower than that deposited by the sol-gel method. In this work, the hybrid process, involving the sol-gel method and laser ablation, was used to make 1.65 mum-thick lead zirconate titanate (PZT) films with well-crystallized perovskite phase at the (111) orientation. We deposited (111)-oriented 0.15 mum-thick PZT film on Pt/Ti/SiO2/Si substrates using the sol-gel method and then deposited 1.5 mum-thick PZT films by laser ablation. The remanent polarization of 28.6 muC/cm(2) and the coercive field of 58.0 kV/cm were obtained while the dielectric constant and loss values measured at 1 kHz were approximately 1050 and 0.045, respectively. The piezoelectric coefficient d(31) was also investigated and found to be 16.65 +/- 4 pC/N. In the application, a micromirror actuated by the hybrid PZT films was designed and fabricated successfully by a three-mask lithography process. The scanning angle of 6 2 degrees was demonstrated, while resonating with 5 V-p.p at the resonance frequency (1975 Hz).

Micro-patterning of PZT Thick Film by Lift-off Using ZnO As a Sacrificial Layer

Fabrication of high quality PZT thick film using lift-off technique

Research of Spray Etching of PZT Film

PZT Film and Si Substrate Two-Layer System Patterning Morphology by Femtosecond Pulsed Laser

Deposition and Patterning Technique for Realization of PZT Thick Film Micro Actuator

A Novel Wet Etching Process of Pb(Zr,Ti)O-3 Thin Films for Applications in Microelectromechanical System

Fabrication of PZT microdevices using a high-yield sol-gel process

Deposition and Patterning Technique for Realization of Pb(Zr0.52, Ti0.48)O3 Thick Film Micro Actuator

Preparation of A High-Quality Pzt Thick Film with Performance Comparable to Those of Bulk Materials for Applications in Mems

Preparation and Application of Lead Zirconate Titanate (PZT) Films Deposited by Hybrid Process: Sol-Gel Method and Laser Ablation

Patterning PZT Thin Films using Reactive Ion Beam Etching for PiezoMEMS, RF MEMS Resonator and Filter Applications

Low Temperature Process for Synthesis of (100) Textured Pb(Zr 0.48 Ti 0.52 )O 3 Thin Films on Si Substrate by Laser Lift-Off Transferring Technique

Processing of PZT Microstructures

High Quality PZT Thick Films Using Silicon Mold Technique for MEMS Applications

Study on Micro-patterning of Vibration Pickup Device Based on PZT Thick Films

Study of Fabrication and Etching Processes of PZT Thin Films on Silicon

Advances of PZT Ferroelectric Thin Films in Etching Techniques

Preparation and characterization of lead zirconate titanate thick films prepared by chemical solution deposition for MEMS applications

Electrical and Mechanical Properties of PZT Thin Films Prepared by Hybrid Process of Sol-Gel Technique and Laser Ablation

Pattern Transfer of Nano-Scale Ferroelectric PZT Gratings by a Reversal Nanoimprint Lithography

The Preparation and Characterization of the PZT Thin Film with (100) Peak Preferred Orientation