Investigation of Performance Enhancement in Inas/Ingaas Heterojunction-Enhanced N-Channel Tunneling Field-Effect Transistor

Genquan Han,Bin Zhao,Yan Liu,Hongjuan Wang,Mingshan Liu,Chunfu Zhang,Shengdong Hu,Yue Hao
DOI: https://doi.org/10.1016/j.spmi.2015.08.027
IF: 3.22
2015-01-01
Superlattices and Microstructures
Abstract:We design a heterojunction-enhanced n-channel tunneling field effect transistor (HE-TFET) with an InAs/In1-xGaxAs heterojunction located in channel region with a distance of LT-H from source/channel tunneling junction. The influence of LT-H on the performance of HE-TFETs is investigated by simulation. Compared with InAs homo-NTFET, the positive shift of onset voltage, the steeper subthreshold swing (SS), and the enhanced on-state current I-ON are achieved in HE-NTFETs, which is attributed to the modulation of the heterojunction on band-to-band tunneling. At a supply voltage of 03 V, I-ON of InAs/In0.9Ga0.1As HE-NTFET with a LT-H of 6 nm demonstrates an enhancement of 119.3% in comparison with the homo device. Furthermore, the impact of Ga composition on the performance of HE-NTFETs is studied. As the Ga composition increases, the average SS characteristics of HE-NTFETs are improved, while the drive current of devices is reduced due to the increasing of tunneling barrier. (C) 2015 Elsevier Ltd. All rights reserved.
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