Abstract:Abstract Ion-induced secondary electron emission at a target surface is an essential mechanism for laboratory plasmas, i.e. magnetron sputtering discharges. Electron emission, however, is strongly affected by the target condition itself such as oxidation. Data of oxidized targets, however, are very sparse and prone to significant systematic errors, because they were often determined by modeling the complex behavior of the plasma. Thus, it is difficult to isolate the process of ion-induced electron emission from all other plasma-surface-interactions. By utilizing ion beams, the complex plasma environment is avoided and electron yields are determined with higher accuracy. In this study, ion-induced secondary electron emission coefficients (SEECs) of clean, untreated (air-exposed), and intentionally oxidized copper and nickel surfaces were investigated in such a particle beam experiment. Pristine and oxidized metal foils were exposed to beams of singly charged argon ions with energies of 0.2 keV - 10 keV. After the ion beam treatment, the surface conditions were analyzed by ex-situ x-ray photoelectron spectroscopy measurements. Further, a model for the electron emission of a partly oxidized surface is presented, which is in agreement with the experimental data. It was found, that oxidized and untreated/air-exposed surfaces do not show the same SEEC: for intentionally oxidized targets, the electron yields were smaller by a factor of 2 than for untreated/air-exposed surfaces. SEECs of oxides were found to be between the values for clean and for untreated metal surfaces. Further, the SEEC was at maximum for untreated/air-exposed surfaces and at minimum for clean surfaces; the electron yields of untreated/air-exposed and clean surfaces were in agreement with values reported in the literature.

Heating-induced variations of secondary electron emission from ion-cleaned copper samples.

Secondary electron yield (SEY) evolution of laser processed oxygen-free high conductivity copper induced by different ultrasonic cleaning durations

Ion-induced secondary electron emission of oxidized nickel and copper studied in beam experiments

Experimental Investigation of Thermal Emittance Components of Copper Photocathode

Measurement of electron beam induced sample heating in SEM experiments

Influence of ion induced secondary electron emission on the stability of ionisation vacuum gauges

Tuning Band Gaps and Photoelectrochemical Properties of Electrodeposited CuO Films by Annealing in Different Atmospheres

Establishing A Laser Treatment to Suppress the Sec-Ondary Electron Emission

The Effect of Magnetic Field on the Secondary Electron Yield in the Ultra-High Vacuum Environment

Electron-beam-induced charging of an Al2O3 nanotip studied using off-axis electron holography

The Chemical Origin of SEY at Technical Surfaces

Variation in formation and migration of self-interstitial atom clusters in electron irradiated copper with material purity and specimen preparation method

Morphological changes, He desorption behaviors, and He bubble evolution of He-charged Cu films prepared by DC magnetron sputtering during annealing

Effects of hot-rolling on secondary electron yield properties of Cu-2.7Be alloy

Characterization of Field Emission from Oxidized Copper Emitters

Changes in electric field noise due to thermal transformation of a surface ion trap

Evolution of Field Emitters on Copper Surface During Conditioning

The Dose Effect in Secondary Electron Emission

Influence of Heat Treatment on Field Emissive Properties of Single-Walled Carbon Nanotubes

Secondary electron spectrum of metals with different surface potential barriers

Thermal Plasma‐Induced Surface Modifications Correlated With the Field Emission Properties of Copper