Image simulation for atomic resolution secondary electron image.

Lijun Wu,R F Egerton,Yimei Zhu
DOI: https://doi.org/10.1016/j.ultramic.2012.06.008
IF: 2.994
2012-01-01
Ultramicroscopy
Abstract:It has been demonstrated recently that an atomic resolution secondary electron (SE) image can be achieved with a scanning transmission electron microscope (STEM) equipped with a probe-aberration corrector. Its high sensitivity to the surface structure provides a powerful tool to simultaneously study both surface and bulk structure in the STEM, in the combination with the annular dark field (ADF) image. To quantitatively explain the atomic resolution SE image and retrieve surface-structure information, an image simulation is required. Here, we develop a method to simultaneously calculate, for the first time, the atomic resolution SE and ADF-STEM images, based on the multislice method with a frozen-phonon approximation. An object function for secondary electrons, derived from the inelastic scattering, is used to calculate the intensity distribution of the secondary electrons emitted from each slice. The simulations show that the SE image contrast is sensitive to the surface structure and the electron inelastic mean free path, but insensitive to specimen thickness when the thickness is more than 5nm. The simulated SE images for SrTiO3 crystal show good agreement with the experimental observations.
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