Reducing Feature-sizes of Two-photon Polymerized Lines by Re-polymerization in SCR500

Li, Yan,Qi, Fengjie,Tan, Dengfeng,Yang, Hong

DOI: https://doi.org/10.1109/CLEO.2007.4452881

2007-01-01

Abstract:Based on re-polymerization between two structures close to each other, the feature-sizes of two-photon polymerized lines using SCR500 were reduced to wavelength/50, which demonstrated the potential for high resolution three-dimensional nanofabrication.

What problem does this paper attempt to address?

Reduction in Feature Size of Two-Photon Polymerization Using Scr500

Dengfeng Tan,Yan Li,Fengjie Qi,Hong Yang,Qihuang Gong,Xianzi Dong,Xuanming Duan

DOI: https://doi.org/10.1063/1.2535504

IF: 4

2007-01-01

Applied Physics Letters

Abstract:Fabricated by femtosecond laser pulses at wavelength λ of 780nm, the feature size of two-photon polymerization using SCR500 was reduced to λ∕50. Lines with sub-25-nm width were produced by controlling the incident laser power and the laser focus scan speed up to 700μm∕s. Based on repolymerization between two structures close to each other, the feature size was further reduced to ∼15nm, which demonstrated the potential for three-dimensional nanofabrication with high spatial resolution.
Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

Chenliang Ding,Xi Liu,Qiulan Liu,Dazhao Zhu,Mengdi Luo,Xiujun Gao,Zhenyao Yang,Qiuyuan Sun,Quanli Qian,Xiaoming Shen,Chun Cao,Shangting You,Liang Xu,Minfei He,Yong Liu,Cuifang Kuang,Xu Liu

DOI: https://doi.org/10.1002/lpor.202300645

2024-01-01

LASER & PHOTONICS REVIEWS

Abstract:Improving the 3D resolution is a decisive step in the transition of direct laser writing from being limited to research use to being a powerful tool. Three-color (3CL) lithography is expected to result in significantly higher resolution with two-color lasers initiating polymerization in two steps and one-color laser inhibiting polymerization. However, the 3CL process increases the complexity of the system and makes the influence of chromatic aberration worse which leads to non-ideal writing results, which is approximate to 80 nm linewidth (approximate to lambda/10) at present. In this study, the 3CL lithography is improved by introducing almost one color (1CL) instead of three colors to achieve subdiffraction 3D nanolithography based on two-photon two-step absorption and photoinhibition (T(2)A-PI). Using benzil as a photoinitiator, a sub-30 nm (<lambda/17.5) lateral feature size, minimum 80 nm lateral, and 160 nm axial pitches are achieved, which, to our knowledge, is the best to be fabricated using the laser in the visible region. 3D woodpile photonic crystals and other high-quality nanostructures are fabricated, demonstrating the unique advantages over existing direct laser writing technologies.
High-resolution 3D Nanoprinting Based on Two-Step Absorption Via an Integrated Fiber-Coupled Laser Diode.

Xi Liu,Chenliang Ding,Xiujun Gao,Xiaoming Shen,Mengbo Tang,Zhenyao Yang,Liang Xu,Cuifang Kuang,Xu Liu

DOI: https://doi.org/10.1364/ol.495286

2023-01-01

Abstract:Three-dimensional (3D) laser nanoprinting with high resolution and low cost is highly desirable for fabricating arbitrary 3D structures with fine feature size. In this work, we use a 405-nm integrated fiber-coupled continuous wave (cw) laser diode to establish an easy-to-build 3D nanoprinting system based on two-step absorption. Two-dimensional (2D) gratings with a sub-150-nm period and 3D woodpile nanostructures with a lateral period of 350 nm have been printed at a low speed. At a faster scan velocity of 1000 µm/s, 2D gratings with sub-200-nm resolution and sub-50-nm linewidth can still be fabricated with laser power less than 1 mW. The two-step absorption of the used benzil initiator enables us to use a second cw laser with 532-nm wavelength to enhance the polymerization with sub-100-nm feature size when starting with insufficient 405-nm laser power, which possess the potential to find applications in high-speed high-resolution parallel-writing and in situ manipulation.
High-speed two-photon lithography based on femtosecond laser

Yang Shunhua,Ding Chenliang,Zhu Dazhao,Yang Zhenyao,Liu Yong,Kuang Cuifang,Liu Xu

DOI: https://doi.org/10.12086/oee.2023.220133

2023-01-01

Abstract:Two-photon polymerization （TPP） based on femtosecond laser has been a research hotspot in 3D micro/nano writing technology.With the increasing demand for processing complex and large-scale miniaturized 3D devices in the fields of life science,material engineering,micro and nano optics,and etc.,the issue of low processing efficiency of TPP is becoming increasingly serious.During the long fabrication period,many disturbances can be introduced in the processing,causing the quality deterioration of the structure and seriously hindering the further popularization and application of these crucial 3D devices.This paper respectively compares the four approaches of single-beam writing,parallel multi-beam writing,pattern projection,and 3D projection exposure based on the TPP lithography efficiency.Moreover,the researches on the optical design of system,the writing accuracy,the fabrication throughput,the writing strategy,and etc.of each approach are also described.And the advantages and disadvantages of these four methods are summerized simultaneously.Finally,we also made a brief prospect to the developing trend of TPL efficiency improvement in the future.
Sub-diffraction Optical Beam Lithography Based on a Center-Non-zero Depletion Laser

Chenyi Su,Chenliang Ding,Zhenyao Yang,Chun Cao,Yiwei Qiu,Dazhao Zhu,Cuifang Kuang,Xu Liu

DOI: https://doi.org/10.1364/ol.504691

IF: 3.6

2024-01-01

Optics Letters

Abstract:Photoinhibition (PI) mechanisms have been introduced in nanofabrication which allows breaking the diffraction limit by large factors. Donut-shaped laser is usually selected as a depletion beam to reduce linewidth, but the parasitic process has made the results of the experiment less than expected. As a result, the linewidth is difficult to achieve below 50 nm with 780 nm femtosecond and 532 nm continuous-wave lasers. Here, we propose a new, to the best of our knowledge, method based on a center-non-zero (CNZ) depletion laser to further reduce linewidth. By constructing a smaller zone of action under the condition of keeping the maximum depletion intensity constant, a minimum linewidth of 30 nm (λ / 26) was achieved. Two ways to construct CNZ spots were discussed and experimented, and the results show the advantages of our method to reduce the parasitic process to further improve the writing resolution.
Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Minfei He,Zhimin Zhang,Chun Cao,Yiwei Qiu,Xiaoming Shen,Guozun Zhou,Zixin Cai,Xinjie Sun,Xin He,Liang Xu,Xi Liu,Chenliang Ding,Yaoyu Cao,Cuifang Kuang,Xu Liu

DOI: https://doi.org/10.1186/s43074-022-00072-2

IF: 16.5

2022-01-01

PhotoniX

Abstract:Advances in direct laser writing to attain super-resolution are required to improve fabrication performance and develop potential applications for nanophotonics. In this study, a novel technique using single-color peripheral photoinhibition lithography was developed to improve the resolution of direct laser writing while preventing the chromatic aberration characteristics of conventional multicolor photoinhibition lithography, thus offering a robust tool for fabricating 2D and 3D nanophotonic structures. A minimal feature size of 36 nm and a resolution of 140 nm were achieved with a writing speed that was at least 10 times faster than existing photoinhibition lithography. Super-resolution and fast scanning enable the fabrication of spin-decoupled metasurfaces in the visible range within a printing duration of a few minutes. Finally, a subwavelength photonic crystal with a near-ultraviolet structural color was fabricated to demonstrate the potential of 3D printing. This technique is a flexible and reliable tool for fabricating ultracompact optical devices.
Beyond 100 nm Resolution in 3D Laser Lithography: Post Processing Solutions

G. Seniutinas,A. Weber,C. Padeste,I. Sakellari,M. Farsari,C. David

DOI: https://doi.org/10.48550/arXiv.1807.08462

2018-07-23

Abstract:Laser polymerization has emerged as a direct writing technique allowing the fabrication of complex 3D structures with microscale resolution. The technique provides rapid prototyping capabilities for a broad range of applications, but to meet the growing interest in 3D nanoscale structures the resolution limits need to be pushed beyond the 100 nm benchmark, which is challenging in practical implementations. As a possible path towards this goal, a post processing of laser polymerized structures is presented. Precise control of the cross-sectional dimensions of structural elements as well as tuning of an overall size of the entire 3D structure was achieved by combining isotropic plasma etching and pyrolysis. The smallest obtainable feature sizes are mostly limited by the mechanical properties of the polymerized resist and the geometry of 3D structure. Thus the demonstrated post processing steps open new avenues to explore free form 3D structures at the nanoscale.

Applied Physics
Resolution Improvement of Femtosecond Laser Induced Two-Photon Polymerization Based on Phase Filtering

Xiang Wang,Jijun He,Jianqiang Ma,Junjun Ding,Jiaru Chu,Wenhao Huang

DOI: https://doi.org/10.1117/1.3574769

IF: 1.3

2011-01-01

Optical Engineering

Abstract:Femtosecond laser induced two-photon polymerization has the advantages of high resolution and capability of true three-dimensional (3D) fabrication. In this work, a phase filter-based super-resolution technique was adopted to reduce the size of focus spot in order to achieve exceeded diffraction limit fabrication resolution. The principle of phase modulation of a femtosecond laser was introduced, the parameters of the phase filter were optimized using a genetic algorithm, and then a 3D super-resolution annular phase filter was fabricated. Experimental results proved that the aspect ratio as well as the axial and radial sizes of solidified units was compressed by the optimized phase filter. A maximum aspect ratio compression ratio of 20.8% was achieved. The radial compression ratio of the modulated spot decreased with the increase of laser exposure amount, while the axial compression ratio and aspect ratio compression ratio increased. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3574769]
Rapid Two‐Photon Polymerization of an Arbitrary 3D Microstructure with 3D Focal Field Engineering

Dong Yang,Lipu Liu,Qihuang Gong,Yan Li

DOI: https://doi.org/10.1002/marc.201900041

IF: 5.006

2019-01-01

Macromolecular Rapid Communications

Abstract:Two-photon polymerization is a powerful method for three-dimensional (3D) precision nanofabrication. To facilitate the fabrication speed, for the first time, single-exposure or single-scan two-photon polymerization of an arbitrary 3D microstructure with smaller or larger volume is demonstrated through focal field engineering. The constraints and the initial conditions of the Gerchberg-Saxton algorithm for the retrieval of the incident wavefront are adapted for the shape fidelity and the smoothness of the 3D focal field intensity distribution. As a result, a small 3D microstructure can be polymerized by a single exposure within 0.1 s, while a larger one can be formed by continuous polymerization of slices of the structure with one-dimensional single scan with a speed of 6 µm s-1 . The microlenses that generate vortex beams with different orbital angular momentums are polymerized to demonstrate the high fabrication precision. These pave the way for the rapid two-photon polymerization of arbitrary 3D structures.
The study on spatial resolution in two-photon induced polymerization

kenji takada,hongbo sun,satoshi kawata

DOI: https://doi.org/10.1117/12.645221

2006-01-01

Abstract:We have previously demonstrated that two-photon induced polymerization allows fabrication of complex three-dimensional structures such as photonic crystals and micromachines with a spatial resolution around 120 nm. In this report, we show the resolution improvement till 65 nm. Experimentally, 780-nm femtosecond laser pulses were focused into a photopolymerizable resin by a high numerical aperture objective lens. The resin is polymerized by means of radical initiation. In the radical polymerization, oxygen molecules dissolved in the resin inhibit the polymerization reactions by scavenging the radicals that initiate the polymerization. At controlled laser pulse energy, the radicals can survive and initiate polymerization only at the region where exposure energy is larger than the polymerization threshold, leading to a sub-diffraction-limited spatial resolution. In order to further improve the fabrication accuracy, we introduced a radical quencher into the resin, and at an optimized concentration the lateral spatial resolution was improved to 100 nm. Moreover, we fabricated a suspended fiber connected between two anchors by controlling the exposure dose within the fiber. After removing the unsolidified resin by ethanol and drying, a 65-nm width fiber was obtained, suggesting a possible spatial resolution of similar dimension. The size less than 1/10 of the excitation wavelength could satisfy requirements of many photonic and optoelectronic devices.
High-Reproducibility And High-Fidelity Two-Photon Photopolymerization Of 3d Photonic Crystals

hongbo sun,takeshi suwa,satoshi kawata

DOI: https://doi.org/10.1109/OMEMS.2003.1233488

2003-01-01

Abstract:A scheme of two-photon laser-scanning quantified pixels was utilized for photonic crystal (PhC) fabrication, leading to a complete solution to existing problems in the field. This technology, together with a deformation compensation approach, makes high reproducibility and high fidelity writing possible. This would be an essential step toward widespread use of the two-photon polymerization technology for PhC research and applications.
Polymerized Nanotips Via Two-Photon Photopolymerization.

Fengjie Qi,Yan Li,Dengfeng Tan,Hong Yang,Qihuang Gong

DOI: https://doi.org/10.1364/oe.15.000971

IF: 3.8

2007-01-01

Optics Express

Abstract:We present new methods to produce polymerized nanotips via two-photon photopolymerization. By gradually changing the laser power, we fabricate a single polymerized tip with the size of 120nm. When two rectangle anchors with protuberances are close enough, lines with the slimmest part of about 20-30nm and tips with the widths of about 35nm are produced between anchors, which are the best resolution obtained with the resin SCR-500 to our knowledge. As the tips are adhered to larger polymerized structures, they can survive post processing in spite of their small sizes.
Two-Photon Polymerization of a 3D Structure Using Focus Engineering

Yan Li,Shi-Jie Zhang,Zhao-Pei Liu,Hong Yang,Qihuang Gong

DOI: https://doi.org/10.1364/nlo.2015.nw4a.12

2015-01-01

Nonlinear Optics

Abstract:Using focus engineering, we have successfully fabricated a 3D microstructure with high resolution by two-photon polymerization with a single exposure. The polymerized array of double-helix structures demonstrates optical chirality.
Refractive index matched polymeric and preceramic resins for height-scalable two-photon lithography

Magi Mettry,Matthew A Worthington,Brian Au,Jean-Baptiste Forien,Swetha Chandrasekaran,Nicholas A Heth,Johanna J Schwartz,Siwei Liang,William Smith,Juergen Biener,Sourabh K Saha,James S Oakdale

DOI: https://doi.org/10.1039/d1ra01733k

2021-06-28

Abstract:Nanofabrication techniques that can generate large and complex 3D structures with nanoscale features are becoming increasingly important in the fields of biomedicine, micro-optics, and microfluidics. Direct laser writing via two-photon polymerization (DLW-TPP) is one such technique that relies on nonlinear absorption of light to form nanoscale 3D features. Although DLW-TPP provides the required nanoscale resolution, its built height is often limited to less than a millimetre. This height limitation is driven by the need to tightly focus the laser beam at arbitrary depths within the photopolymer. This requirement necessitates matching the photopolymer's refractive index to specific values but the required techniques have not been disseminated widely in the open scientific literature. To address this knowledge gap, we test two universal, different approaches to generate refractive index-matched polymeric and preceramic resins and demonstrate their performance by printing of fine submicron features in 3D structures as tall as 2.5 mm. Specifically, we achieve index-matching by mixing commercially-available resins or covalent modification of functional monomers. This work investigates the relationship of voxel shape to RI mismatch, and presents tuning of RI through mixing and covalent modification to a nonconventional material system of preceramic resin which has never been demonstrated before. We demonstrate the material flexibility by generating 3D silicon oxycarbide structures from preceramic resists while simultaneously eliminating the part-height limitation of conventional DLW-TPP.
Individually Controlled Multi-Focus on a Line for Two-Photon Polymerization Based on Computer-Generated Holograms

Jiawen Li,Liang Yang,Yanlei Hu,Chenchu Zhang,Jiaru Chu,Wenhao Huang

DOI: https://doi.org/10.1117/12.2021074

2013-01-01

Abstract:Two-photon polymerization is a powerful technique in the area of functional micro/nano device fabrication. The greatest limiting factor in widespread use of this technique is the low efficiency because the structure is fabricated by point-by-point scanning. In recent years, computer generated hologram is used for parallel fabrication via multi foci. In this paper, we proposed a new rapid fabrication method which use desirable multi-focus pattern as scanning cell instead of single focus point or foci array to polymerize. We establish a femtosecond laser experimental setup involved in a liquid crystal spatial light modulator. The computer generated hologram pattern on spatial light modulator is used to produce desirable foci array. The position and intensity of each focus in the pattern can be controlled well by optimal design. We use multi foci in a line as scanning cell to fabricate some revolving structure and the Fresnel lens can be expected. This work provides a new method to greatly improve the efficiency of two-photon polymerization production in fabricating revolving structures.
Size-dependent behaviors of femtosecond laser-prototyped polymer micronanowires.

Kenji Takada,Dong Wu,Qi-Dai Chen,Satoru Shoji,Hong Xia,Satoshi Kawata,Hong-Bo Sun

DOI: https://doi.org/10.1364/OL.34.000566

IF: 3.6

2009-01-01

Optics Letters

Abstract:A remarkable recent progress in two-photon photopolymerization is the achievement of fabrication resolution around tens of nanometers, establishing a femtosecond laser as a nanofabrication tool. However, how the superresolution has been made possible is still under arguement. We propose a concept of polymer network permeability to solvents, meaning a structure-loosened nanopolymer state that allows free penetration of small molecules to interpret the mechanism. Experimentally, we found proof showing existence of the state, including an unusually large volume shrinkage rate (>60%), shape-memory effect, a giant softness of nanospring, and the mechanical stability of rinsed two-photon written polymer nanowires. (C) 2009 Optical Society of America
Pinpoint Two-Photon Writing And Multi-Beam Interferential Patterning Of Three-Dimensional Polymer Photonic Crystals

S Kawata,S Shoji,Hb Sun

2004-01-01

IEICE Transactions on Electronics

Abstract:Lasers have been established as a unique nanoprocessing tool due to its intrinsic three-dimensional (3D) fabrication capability and the excellent compatibility to various functional materials. Here we report two methods that have been proved particularly promising for tailoring 3D photonic crystals (PhCs): pinpoint writing via two-photon photopolymerization and multibeam interferential patterning. In the two-photon fabrication, a finely quantified pixel writing scheme and a method of pre-compensation to the shrinkage induced by polymerization enable high-reproducibility and high-fidelity prototyping; well-defined diamond-lattice PhCs prove the arbitrary 3D processing capability of the two-photon technology. In the interference patterning method, we proposed and utilized a two-step exposure approach, which not only increases the number of achievable lattice types, but also expands the freedom in tuning lattice constant.
Two-photon polymerization system based on a resonant scanner for high-throughput production of tissue engineering microscaffolds

Stefan Binder,Franziska Chalupa-Gantner,Han Woong Yoo,Tommaso Zandrini,Aleksandr Ovsianikov

DOI: https://doi.org/10.1016/j.addma.2024.104601

IF: 11

2024-12-12

Additive Manufacturing

Abstract:Two-photon polymerization (2PP) is a 3D printing technique renowned for its outstanding resolution and the capability to produce complex structures directly within a material volume. While the technology has matured substantially since its first demonstration, the long processing times attributed to the high resolution, remain a significant obstacle for the use of 2PP in production. This study introduces a novel 2PP setup designed to address this limitation by significantly boosting the throughput, by at least one order of magnitude compared to existing commercial products. This improvement is realized through the implementation of a resonant scanner technology to rapidly direct the laser during fabrication. All optical components were selected carefully, to avoid any limitations that may emerge when the scanner is no longer the lone bottleneck for production throughput. Additionally, newly developed characterization and calibration methods, employed to optimize structuring accuracy and throughput, are discussed.

engineering, manufacturing,materials science, multidisciplinary
Refining multi-photon polymerization feature size by optimizing solvent content in SU-8 photoresist

Yuchen Shao,Yuan'an Zhao,Hao Ma,Cheng Li,Dawei Li,Jianda Shao

DOI: https://doi.org/10.1016/j.optmat.2021.110800

IF: 3.754

2021-02-01

Optical Materials

Abstract:An investigation of the impact of solvent content on polymerization feature size in multi-photon polymerization is presented. The negative tone, epoxy photoresist SU-8 is employed, and variety pre-baking time is set to obtain different solvent content. A convenient method, exposure under long-focal length and single pulse, is suggested to evaluate the impact of solvent. By measuring the polymer size under microscope, it shows that the polymerized diameters are reduced by ~40% due to only 4% loss of the solvent content. The inhibition of the mobility of photon-induced H+ cations due to the less solvent is considered to be responsible for the refinement of polymer feature size. It is because that the mobility of photon-induced H+ cation from high to low concentration area is restricted by reducing the solvent. The adjusting solvent content shows its potential to refine the feature size of MPP without influencing the degree of polymerization.

materials science, multidisciplinary,optics
Micro- and Nanofabrication Using Bessel-beam Activated Photopolymerization

He Cheng,Chun Xia,Mingman Sun,Meng Zhang,Stephen M. Kuebler,Xiaoming Yu

DOI: https://doi.org/10.2351/7.0000079

IF: 2.1

2020-01-01

Journal of Laser Applications

Abstract:Microfabrication based on photopolymerization is typically achieved by scanning a focal spot within the material point by point, which significantly limits the fabrication speed. In our previous study, the authors explored a method for rapid fabrication of high-aspect-ratio micro- and nanostructures by scanning the Bessel beam in the plane transverse to the direction of beam propagation. However, the structure fabricated by this method suffers from the surface texture. In this work, the origin of these effects is investigated by the in situ measurement of the photopolymerization process. By scanning the laser beam at a speed faster than the polymerization that takes place at any given position, we show that it is possible to eliminate the surface texture and obtain smooth surface finish.

Reducing Feature-sizes of Two-photon Polymerized Lines by Re-polymerization in SCR500

Reduction in Feature Size of Two-Photon Polymerization Using Scr500

Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

High-resolution 3D Nanoprinting Based on Two-Step Absorption Via an Integrated Fiber-Coupled Laser Diode.

High-speed two-photon lithography based on femtosecond laser

Sub-diffraction Optical Beam Lithography Based on a Center-Non-zero Depletion Laser

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Beyond 100 nm Resolution in 3D Laser Lithography: Post Processing Solutions

Resolution Improvement of Femtosecond Laser Induced Two-Photon Polymerization Based on Phase Filtering

Rapid Two‐Photon Polymerization of an Arbitrary 3D Microstructure with 3D Focal Field Engineering

The study on spatial resolution in two-photon induced polymerization

High-Reproducibility And High-Fidelity Two-Photon Photopolymerization Of 3d Photonic Crystals

Polymerized Nanotips Via Two-Photon Photopolymerization.

Two-Photon Polymerization of a 3D Structure Using Focus Engineering

Refractive index matched polymeric and preceramic resins for height-scalable two-photon lithography

Individually Controlled Multi-Focus on a Line for Two-Photon Polymerization Based on Computer-Generated Holograms

Size-dependent behaviors of femtosecond laser-prototyped polymer micronanowires.

Pinpoint Two-Photon Writing And Multi-Beam Interferential Patterning Of Three-Dimensional Polymer Photonic Crystals

Two-photon polymerization system based on a resonant scanner for high-throughput production of tissue engineering microscaffolds

Refining multi-photon polymerization feature size by optimizing solvent content in SU-8 photoresist

Micro- and Nanofabrication Using Bessel-beam Activated Photopolymerization