A Single Device Based Voltage Step Stress (VSS) Technique for Fast Reliability Screening

Z. Ji,J. F. Zhang,W. Zhang,X. Zhang,B. Kaczer,S. De Gendt,G. Groeseneken,P. Ren,R. Wang,R. Huang
DOI: https://doi.org/10.1109/irps.2014.6861145
2014-01-01
Abstract:A new wafer-level reliability qualification methodology is proposed. Unlike conventional method which usually takes days to completion, the total test time of the new technique can be shortened within 2 hours. Besides, it only requires a single device. This new technique is easy to implement on commercial equipment and it has been successfully validated on different processes including the most advanced 28nm process with both SiON and high-k gate stacks. This new technique can be an effective tool for fast reliability screening during process development in future.
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