Novel voltage step stress (VSS) technique for fast lifetime prediction of hot carrier degradation

xixiang feng,pengpeng ren,zhigang ji,runsheng wang,ketul b sutaria,yu cao,ru huang
DOI: https://doi.org/10.1109/ICSICT.2014.7021226
2014-01-01
Abstract:Hot carrier injection (HCI) is one of the critical de-vice degradation mechanisms, and is conventionally characterized with constant voltage stress (CVS) method. A novel voltage-step stress (VSS) methodology is pro-posed to quickly characterize HCI degradation, based on a simplified reaction-diffusion model. This wafer-level reliability qualification methodology for HCI requires only one single device, and the total test time can be con-trolled within 2 hours. Therefore, this new technique can be an effective tool for fast reliability screening for HCI during process development in the future.
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