“SumiTune” High-Precision Temperature Distribution Control System for Single-Wafer Film Deposition Equipment

K. Itakura,S. Sakita,K. Kimura
Abstract:Semiconductor products are indispensable for 5th Generation (5G) communication (next-generation standard), automated driving technology enabled by artificial intelligence (AI), and large capacity storage for data centers. A variety of heaters are used in the semiconductor manufacturing process to heat semiconductor wafers. Notably, wafers must be heated in many steps in the frontend process, including the application of a photoresist film on wafers, chemical vapor deposition (CVD) to deposit various types of films on wafers, and dry/wet etching to etch the wafer surface. It supports different temperature ranges (room temperature to 1,000°C), using various heaters. Recently, there has been a growing need to increase the processing speed of multi-core central processing units (CPUs) and GPUs*1 for AI and to increase the storage capacity of data centers. Against this backdrop, there has been growing demand for miniaturization of the circuit wiring to increase the integration degree of processing units. This requires formation of a homogeneous film. It is also essential to achieve uniform temperature distribution on the wafer surface. SumiTune, which is introduced in this paper, achieves highly uniform temperature distribution on the wafer surface by means of multi-zone control, which was difficult to achieve in the conventional single-wafer film deposition equipment. This is a next-generation system that can meet the demand for miniaturization of the circuit wiring.
Engineering,Materials Science
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