Cmos Compatible Nonvolatile Memory Devices Based On Sio2/Cu/Sio2 Multilayer Films

Wang Yan,Liu Qi,Lv Hang-Bing,Long Shi-Bing,Zhang Sen,Li Ying-Tao,Lian Wen-Tai,Yang Jian-Hong,Liu Ming
DOI: https://doi.org/10.1088/0256-307X/28/7/077201
2011-01-01
Chinese Physics Letters
Abstract:We systematically investigate the resistive switching characteristics of SiO2 films with a Cu/SiO2/Cu/SiO2/Pt multilayer structure. The device exhibits good resistive switching performances, including a high ON/OFF resistance ratio (> 10(3)), good retention characteristic (> 10(4) s), satisfactory switching endurance (> 200 cycles), a fast programming speed (< 100 ns) and a high device yield (similar to 100%). Considering these results, SiO2-based memories have highly promising applications for nonvolatile memory devices.
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