Improvement of electron transport in a ZnSe nanowire by in situ strain

Yanguo Wang,Qinglin Zhang,Taihong Wang,Wei Han,Shaoxiong Zhou
DOI: https://doi.org/10.1088/0022-3727/44/12/125301
2011-01-01
Abstract:Strain is introduced in a single ZnSe nanowire by compressive stress in situ applied along the axial direction, which controllably bends the nanowire under transmission electron microscope inspection. Meanwhile, the I-V measurement of a single ZnSe nanowire before and after the strain is carried out in order to investigate the influence of strain on the electrical properties of the individual ZnSe nanowire. A remarkable jump of about 100% in current and a reduction of about 30% in threshold voltage are detected when the stress is applied along the longitudinal direction of the nanowire. The advantage of stress-induced strains is to produce both compression and tension simultaneously in a single nanowire, which enhance the electron and hole mobilities and significantly improve the electron transport as a consequence. Narrowing the band gap due to the tensile strain, confirmed by theoretical calculation, is responsible for the reduction of threshold voltage. The stress-induced strains in the ZnSe nanowire are favourable for optimization of the carrier transport.
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