Structural, Optical and Electrical Properties of Zn1−xCdxO Thin Films Prepared by PLD

B. J. Zheng,J. S. Lian,L. Zhao,Q. Jiang

DOI: https://doi.org/10.1016/j.apsusc.2011.01.070

IF: 6.7

2011-01-01

Applied Surface Science

Abstract:Ternary polycrystalline Zn1−xCdxO semiconductor films with cadmium content x ranging from 0 to 0.23 were obtained on quartz substrate by pulse laser deposited (PLD) technique. X-ray diffraction measurement revealed that all the films were single phase of wurtzite structure grown on c-axis orientation with its c-axis lattice constant increasing as the Cd content x increasing. Atomic force microscopy observation revealed that the grain size of Zn1−xCdxO films decreases continuously as the Cd content x increases. Both photoluminescence and optical measurements showed that the band gap decreases from 3.27 to 2.78eV with increasing the Cd content x. The increase in Cd content x also leads to the broadening of the emission peak. The resistivity of Zn1−xCdxO films decreases evidently for higher values of Cd content x. The shift of PL emission to visible light as well as the decrease of resistivity makes the Zn1−xCdxO films potential candidate for optoelectronic device.