Flexible resistive switching memory based on Mn0.20Zn 0.80O/HfO2 bilayer structure

Hai Zhou,Guojia Fang,Yongdan Zhu,Nishuang Liu,Meiya Li,Xingzhong Zhao
DOI: https://doi.org/10.1088/0022-3727/44/44/445101
2011-01-01
Abstract:We have investigated Mn0.20Zn0.80O/HfO2 bilayer structure resistance memory fabricated on flexible Kapton substrates. The Mn0.20Zn0.80O/HfO2 bilayer structure shows a steady and bipolar resistive switching characteristic with an on/off ratio of similar to 70 at 0.5 V. Through the bending investigation, our flexible memory exhibits no degradation in switching property, even when the substrate is bent up to 11 mm radius. The resistive switching mechanism of the Mn0.20Zn0.80O/HfO2 bilayer structure can be attributed to the control of oxygen vacancies in HfO2 through the forward or reverse bias.
What problem does this paper attempt to address?