Transport properties of a Fe0.04Si0.96 film at low temperatures

WeiFeng Su,Jian Wang,Heyuan Zhu,Yongliang Fan,Zuimin Jiang
DOI: https://doi.org/10.1088/0022-3727/44/8/085401
2011-01-01
Abstract:The transport properties of a Fe0.04Si0.96 film are studied. From the relationship between the resistivity of the film and the temperature, two activation energies, 40 and 2.5 meV, are obtained in two low-temperature regions below 50K. Temperature-dependent magnetoresistance (MR) shows a peak feature with the largest value of 935% at 30 K. MR values are also measured under different configurations of field direction with respect to the current direction and the film plane, and their relationship in magnitude is discussed in terms of curving of carrier trajectories and shrinkage of wave function of localized states in a magnetic field.
What problem does this paper attempt to address?