Abstract:Molybdenum (Mo), which is one among the refractory metals, is a promising material with a wide variety of technological applications in microelectronics, optoelectronics, and energy conversion and storage. However, understanding the structure–property correlation and optimization at the nanoscale dimension is quite important to meet the requirements of the emerging nanoelectronics and nanophotonics. In this context, we focused our efforts to derive a comprehensive understanding of the nanoscale structure, phase, and electronic properties of nanocrystalline Mo films with variable microstructure and grain size. Molybdenum films were deposited under varying temperature (25–500 °C), which resulted in Mo films with variable grain size of 9–22 nm. The grazing incidence X-ray diffraction analyses indicate the (110) preferred growth behavior the Mo films, though there is a marked decrease in hardness and elastic modulus values. In particular, there is a sizable difference in maximum and minimum elastic modulus values; the elastic modulus decreased from ~460 to 260–280 GPa with increasing substrate temperature from 25–500 °C. The plasticity index and wear resistance index values show a dramatic change with substrate temperature and grain size. Additionally, the optical properties of the nanocrystalline Mo films evaluated by spectroscopic ellipsometry indicate a marked dependence on the growth temperature and grain size. This dependence on grain size variation was particularly notable for the refractive index where Mo films with lower grain size fell in a range between ~2.75–3.75 across the measured wavelength as opposed to the range of 1.5–2.5 for samples deposited at temperatures of 400–500 °C, where the grain size is relatively higher. The conductive atomic force microscopy (AFM) studies indicate a direct correlation with grain size variation and grain versus grain boundary conduction; the trend noted was improved electrical conductivity of the Mo films in correlation with increasing grain size. The combined ellipsometry and conductive AFM studies allowed us to optimize the structure–property correlation in nanocrystalline Mo films for application in electronics and optoelectronics.

Properties of MoO3 Films Deposited by Electron Beam Evaporation

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Optical absorption studies in molybdenum trioxide thin films

Structural, Optical and Mechanical Properties of Nanocrystalline Molybdenum Thin Films Deposited under Variable Substrate Temperature

Temperature-dependent Optical Properties of Low-Loss Plasmonic SrMoO3 Thin Films

Comparison of Structural and Optical Properties of ZnO Films Grown on Different Substrates at Low Temperatures

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Evolution of the Electronic Structure of CaO Thin Films Following Mo Interdiffusion at High Temperature

Study of MoO3 Surface Diffusion on the Al2O3 Film

Impact of Mo+2 addition and thermal annealing on the surface morphology, electrical transport properties and Mott's parameters of WO3 films for potential photonic devices

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Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing

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Diffusing behavior of MoO3 on Al2O3 and SiO2 thin films

Optical, Optoelectronic, and Third‐Order Nonlinear Photonics of Ultrathin Molybdenum oxide Film Deposited by Atomic Layer Deposition

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