Optical, Optoelectronic, and Third‐Order Nonlinear Photonics of Ultrathin Molybdenum oxide Film Deposited by Atomic Layer Deposition

Mohamed A. Basyooni,Yasemin Gündoğdu,Hamdi Şükür Kiliç,Yasin Ramazan Eker
DOI: https://doi.org/10.1002/pssa.202200689
2023-01-20
physica status solidi (a) - applications and materials science
Abstract:The atomic layer deposition (ALD) technique has attracted significant attention due to it enables the control of film synthesis at the sub‐nanometre scale. In this study, we have prepared Molybdenum oxide (MoO3) ultrathin films using the ALD system through Bis(t‐butylimido)bis(dimethylamino)molybdenum (VI) as a Molybdenum (Mo) source. To understand the effect of deposition temperature, thin films were prepared at three different temperatures 100, 150, and 250o C. The morphological and elemental properties were assessed using a field emission scanning electron microscope (FESEM), scanning transmission electron microscopy (STEM), and energy‐dispersive X‐ray (XRD) spectroscopy techniques. It was observed that the film thicknesses increased with the increase in the deposition temperature. It is found that the film growth at 150o C is the most potential one for UV optoelectronic applications with high stability even under low applied bias voltages. Moreover, these films show interesting Nonlinear optical behaviors as investigated with the z‐scan technique applying open and closed aperture methods. The calculated nonlinear optical parameters including nonlinear absorption coefficient (β), nonlinear refractive index (n2), nonlinear refractive coefficient (γ), and third‐order nonlinear susceptibility (χ (3) ) are 10‐11 m/W, 10‐16 cm2/W, 10‐11 cm2/W, and 10‐11 esu, respectively. This article is protected by copyright. All rights reserved.
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