Abstract:A laser‐based solution to produce highly‐controllable arrays of deep nanoholes at the surface of dielectric materials is reported. Dedicated shaping of a short‐pulse laser beam is exploited to process dense square arrays of holes with diameters down to 200 nm and depths in the range 3–20 μm. This opens perspectives for manufacturing integrated devices using this cost‐effective alternative nanofabrication method. Periodic nanohole arrangements constitute an important building block of advanced photonic devices. Aside from standard nanofabrication tools, a direct laser‐based approach is introduced here, that enables single‐step and point‐by‐point machining of arrays of holes with subwavelength diameters and depths reaching several micrometers at the surface of fused silica. The method relies on a simple optical arrangement including an axicon combined with an amplitude mask to shape the laser intensity in appropriately truncated micro‐Bessel beams of adjustable length. The suitability and limitations of the technique are investigated to fabricate arrays of cylindrical nanoholes with tunable depths. In particular, the challenge of avoiding crosstalk effects during the laser‐writing process of high‐density arrays is explored. The achievability of square arrays of nanoholes at the surface of fused silica, with diameters down to 200 nm and variable depths from 3 to 20 μm at a spatial density defined by a pitch of 1.5 μm is demonstrated. The performance level shows the potential of the direct‐laser‐processing method towards the realization of integrated devices, offering a highly flexible and cost‐effective alternative technique to current nanofabrication methods.

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Fabrication of micro hole array on the surface of CVD ZnS by scanning ultrafast pulse laser for antireflection

Periodic nanohole array structure induced on a silicon surface by direct writing with a femtosecond laser

Patterned Microstructure Array Fabrication By Using A Novel Standing Surface Acoustic Wave Device

Simple, fast, and cost-effective fabrication of wafer-scale nanohole arrays on silicon for antireflection

Simple Fabrication of Closed-Packed IR Microlens Arrays on Silicon by Femtosecond Laser Wet Etching

Deepening of nanograting structures on Si by a two-step laser spatial-selective amorphization strategy combined with chemical etching

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Hydrophobic Light-Trapping Structures Fabricated on Silicon Surfaces by Picosecond Laser Texturing and Chemical Etching

Fabrication of Micro-Pillar Array on Silicon Surface by Femtosecond Laser Direct Writing Mask

Fabrication of Concave Spherical Microlenses on Silicon by Femtosecond Laser Irradiation and Mixed Acid Etching.

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Fabrication of Microstructures on Silicon by Multiple Beam Holographic Method Using Nanosecond Laser Pulses

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Nanopatterning Of Silicon Via The Near-Field Enhancement Effect Upon Double-Pulse Femtosecond Laser Exposure

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Sub-Micron-Structure Array on Silicon Surface Fabricated by Dielectric Microsphere Assisted Laser Irradiation Followed by Chemical Etching

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Formation of Array Microstructures on Silicon by Multibeam Interfered Femtosecond Laser Pulses