Abstract:Silicon-based optoelectronics, using the mature silicon-based microelectronic complementary metal oxide semiconductor (CMOS) manufacturing process, is a large-scale optoelectronic integration platform that has attracted much attention. Surface plasmonic devices have also received extensive attention in the past decades, and especially the silicon-based surface plasmonic nanofocusing devices have become a research hotspot. Typical nanofocusing structures include chirped surface gratings, plasmonic Fresnel zone plate, nano-slit array, tapered metal tips. However, there occur some inevitable problems in these devices, such as the fine structure being too complex to be fabricated and too large transmission loss of metal slot waveguide. In this work, an ultra-compact hybrid surface plasmon nanofocusing device is designed and fabricated by the silicon-based optoelectronic technology, and the nanofocusing performance of the device is also experimentally verified. The hybrid surface plasmon nanofocusing devices are fabricated on a silicon-on-insulator (SOI) wafer by electron beam lithography (EBL) system. The silicon wire waveguides, tapers and the thin silicon strips in the middle of nanofocusing regions are patterned in only one step EBL. The gold layer is formed by a deposition and lift-off process, and then a partially etching process is introduced to make the thickness of the middle thin silicon strips the same as that of the gold layer. With a 1.23-mu m-long tapered structure, our nanofocusing devices focus the light field of a silicon strip waveguide into a hybrid surface plasmon waveguide, making non-resonant optical field increase 20 times in the 1550 nm near-infrared band experimentally. The entire insertion loss is about 4.6 dB, and the mode area of the nanofocusing area is about (lambda/n)(2) / 6 40 which is over 300 times smaller than that of the input silicon waveguide. When the middle slot silicon waveguide width W-Si = 120 nm, the insertion loss reaches a minimum value of 2.8 dB. In our design, we adopt the design of silicon-based hybrid plasmonic waveguides. In this design, a layer of material with low refractive index is inserted between the metal layer and the silicon layer to act as a "container" of light field, which makes this silicon-based hybrid plasmonic waveguides have less loss than the traditional metal plasmonic waveguides, and can still maintain high optical field localization. Such silicon-based hybrid surface plasmon nanofocusing devices with simple structures and excellent performances are promising alternatives for future applications in optical field manipulation, optical sensing, nonlinear optical devices, and optical phase-change storage.

Fabrication of 3-D light concentrating microphotonic structures by anisotropic wet etching of silicon

Fabrication of Optical Cavities with Femtosecond Laser Pulses

Experimental research on ultracompact silicon hybrid plasmonic nanofocusing device

Laser microstructuring of Si surfaces for low-threshold field-electron emission

Focusing and Diffraction of Light by Periodic Si Micropyramidal Arrays

In-chip microstructures and photonic devices fabricated by nonlinear laser lithography deep inside silicon

Engineering Efficient Light Sources for Silicon Photonics: III-V Nano-heterostructures Monolithically Grown on Silicon

Single-pulse Writing of a Concave Microlens Array.

Fabrication of Large-Area Silicon Spherical Microlens Arrays by Thermal Reflow and ICP Etching

Fabrication and Characterization of Monolithic 3D Amorphous Silicon Inverse-opal Photonic Materials with Magnesiothermic Reduction at a Lower Temperature

Laser nanofabrication inside silicon with spatial beam modulation and anisotropic seeding

Microfabrication by Femtosecond Laser Irradiation

Convex Silica Microlens Arrays Via Femtosecond Laser Writing.

A novel fabrication technique for three-dimensional concave nanolens arrays

Anisotropic wet etching of a novel micro-texture structure for an Al/n-Si/Al metal–semiconductor–metal photodetector fabrication

Laser nano-fabrication inside silicon with spatial beam modulation and non-local seeding

Optical Nanofabrication of Concave Microlens Arrays

Recent Progress of Lithographic Micro Fabrication by the Tpa-Induced Photopolymerization

Monolithic Kilopixel Silicon Microlens Arrays for Future Far-Infrared Observatories

Monolithic Integrations of Slanted Silicon Nanostructures on 3D Microstructures and Their Application to Surface Enhanced Raman Spectroscopy

Grayscale Electron Beam Lithography Direct Patterned Antimony Sulfide