Abstract:Searching for the relationship between the nanostructure and optical properties has always been exciting the researchers in the field of optics (linear optics as well as non-linear optics), energy harvesting (anti-reflective Si solar cells, perovskite solar cells, ..., etc.), and industry (anti-reflection coating on car windows, sunglasses, etc.). In this work, we present an approach for nanostructuring the silicon substrate to silicon photonic crystals. By precisely controlling the etching time and etching path after using nanoimprint lithography, ordered arrays of inverted Si nanopyramids and Si nanopillars with good homogeneity, uniform surface roughness, high reproducibility of pattern transfer, and a controllable aspect ratio are prepared. Experimental investigation of the optical properties indicates that the reflections of these Si nanostructures are mainly determined by the aspect ratio as well as the period of nanostructures. Furthermore, we have experimentally observed visible-light scattering (V-LS) patterns on inverted Si nanopyramids and Si nanopillars, and their corresponding patterns can be precisely controlled by the patterned nanostructures. The V-LS pattern, background, and "ghost peaks" on the angle-resolved scattering results are caused by constructive interference, destructive interference, and the interference situation between both. This controllable nanopatterning on crystalline Si substrates with precisely tunable optical properties shows great potential for applications in many fields, for example, optics, electronics, and energy.

Manipulations of Light by Ordered Micro-Holes in Silicon Substrates.

Periodic Organic–Inorganic Halide Perovskite Microplatelet Arrays on Silicon Substrates for Room‐Temperature Lasing

Tailoring Patterned Visible-Light Scattering by Silicon Photonic Crystals

Simulation and Experimental Study on Anti-reflection Characteristics of Nano-patterned Si Structures for Si Quantum Dot-Based Light-Emitting Devices

Tuning the peak position of subwavelength silica nanosphere broadband antireflection coatings.

Manipulation of Absorption in Si Thin Films with Ordered Nanostructures

Light Trapping in Semiconductor Thin Film with Disordered Nanoholes

Fabrication of Anti-reflecting Si Nano-structures with Low Aspect Ratio by Nano-sphere Lithography Technique

ITO Nanowire Networks Coating on Μ-Hole Arrayed Substrate As Super-Broadband Antireflection Layer

Light Trapping in Thin Film Disordered Nanohole Patterns: Effects of Oblique Incidence and Intrinsic Absorption

Depth-Dependent Anti-Reflection and Enhancement of Luminescence from Si Quantum Dots-Based Multilayer on Nano-Patterned Si Substrates

Tailoring optical transmission via the arrangement of compound subwavelength hole arrays.

Wavefront Shaping of Infrared Light Through A Subwavelength Hole

Morphological and Optical Properties of Silicon Nanoholes Produced by Pt-nanoparticles Assisted Chemical Etching

Narrow-Line Light Emission from Porous Silicon Multilayers and Microcavities

Enhanced Absorption and EQE of Si MSM Photodiodes with Integrated Periodic Arrays of Holes

Surface silicon nanostructure for enhancement of blue light absorption

Limitation of Optical Properties Through Porous Silicon Photonic Crystals Influenced by Porosity and Lattice Dynamic

Optimization of Porous Silicon Structure As Antireflective Material

Subwavelength Structured Silicon Waveguides and Photonic Devices

The polarization modulation and fabrication method of two dimensional silica photonic crystals based on UV nanoimprint lithography and hot imprint