Realization of Cylindrical Submicron Shell Arrays by Diffraction-Introduced Photolithography

Haiyang Mao,Yulong Zhang,Wengang Wu,Gongchen Sun,Jun Xu
DOI: https://doi.org/10.1088/0960-1317/21/8/085004
2011-01-01
Journal of Micromechanics and Microengineering
Abstract:In this paper, we present an approach for the fabrication of cylindrical shell arrays with shell thickness of a few hundred nanometers. This approach is based on introducing diffraction into conventional ultraviolet photolithography, which is realized by deliberately leaving a gap between mask patterns and photoresist surfaces. The cylindrical shells generated from this method have external diameters from 1.5 to 4.5 mu m, internal diameters from 0.5 to 3.5 mu m, and heights of 10-15 mu m at most, while side lengths of original square mask patterns (or diameters of circular mask patterns) are within 2-5 mu m. Experimental results indicate that these cylindrical submicron shell arrays are reproducible and uniform in morphologies and dimensions. The optical principle of the fabrication is simulated based on Fresnel diffraction theory. Moreover, the cylindrical submicron shell arrays fabricated herein may find applications in bio-chemical and micro/nano-fluidic fields.
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