Abstract:This study examined the development of Fe2B (diiron boronize) coatings on the surface of 35NiCrMo4 steel through the thermochemical surface hardening process called boronizing. The morphology and thickness of the boronize coatings were assessed using Scanning Electron Microscopy (SEM) and optical microscopy (OM). A novel mathematical mass transfer model was developed to estimate the diffusion coefficients of boron in hard coating. The presence of uniformly distributed boronize coatings with a typical sawtooth pattern on the surface of the substrate was confirmed. The boronize coating's chemical composition and phase constituents were analyzed utilizing X-ray energy dispersive spectroscopy (EDS) and X-ray diffraction analysis (XRD). The study confirmed the presence of a single-phase boronize coating (Fe2B). Furthermore, microhardness tests indicated that the boronized specimen's surface demonstrated an average hardness of approximately 1953 HV. The wear study were conducted using the pin-on-disk method under dry debonding conditions at room temperature to estimate the coefficient of friction (COF) of the boronized (average ≈ 0.35) and untreated (0.725) specimens. The results revealed approximately 200% improvement in wear resistance due to the boronized coating. The empirical validation of the mathematical model was carried out for two additional boronizing conditions at 1223 K for 3 h and 1273 K for 1.5 h, resulting in an estimated percentage error of around 2.5% for both conditions. Additionally, an ANOVA analysis was performed, taking into account the temperature and time factors. The findings indicate that both factors exert a substantial influence on the dependent variable (u), with temperature (T) contributing 64.68%, time (t) contributing 27.37%, and the interaction of both factors (T × t) contributing 5.13%.

Influence of Pulse Electrodeposition Parameters on Thickness of Boronized Layer by Orthogonal Test

Effect of Current Density on Composition and Microstructure of Boronized Layer by Electrodeposition

Effect of the Duty Cycle on Boronized Layer Formed by Pulse Electrodeposition

Effect of Borax Content on Composition and Microstructure of Boride Layer by Electrodeposition

Growth kinetics of boride layer by molten salt electrodeposition

Effects Of Electrolytic Parameters On The Deposition Of Boron At The Cathode During Molten Salt Electrolysis Of Silicon

Effect of Boron on Composition and Microstructure of the Siliconized Layers Prepared by Electrodeposition in Molten Salts

Effect of Current Density, Reaction Temperature and Deposition Time on the Electrodeposition of ZrB2 Coating

Influence of boron concentration on growth characteristic and electro-catalytic performance of boron-doped diamond electrodes prepared by direct current plasma chemical vapor deposition

Influence of material type and surface roughness of substrate on boronization and its performance

Effect of carbon and nitrogen diffusion zone on growth mechanism of boride layer produced on Q235 Steel

Effect of Boron on the Formation of the Naturally Deposited Film and Its Corresponding Interfacial Heat Transfer Behavior in Strip Casting of Boron-Containing Steel

Influence Of Carbon Source Concentration On Characterization Of Boron-Doped Diamond Electrodes

Influence of Boron-doping on Electrical Properties of Na-Si:H Thin Film Prepared by PECVD

Electrodeposition of Nb-Sn Alloy from Ambient-Temperature Molten Salt Electrolytes by Pulse Electrolysis.

Process Optimization and Structural Characterization of Fe3Si Layer by Pulse Electrodeposition

Influence of Duty Cycle on Composition and Microstructure of Siliconized Layer Using Pulse Electrodeposition

Fabrication and Characterization of Porous Titanium-Based PbO2 Electrode Through the Pulse Electrodeposition Method: Deposition Condition Optimization by Orthogonal Experiment.

Boronize Coatings Studied with a New Mass Transfer Model

The Effect of Boron Doping on Structure and Electrochemical Performance of Lithium-Rich Layered Oxide Materials.

Insights on the pulsed-DC powder-pack boriding process: The role of the electric charge on the growth of the boride layer and the semiconductor behavior of the boriding media