Abstract:Laser-induced damage on fused silica optics remains a major issue that limits the promotion of energy output of large laser systems. Subsurface impurity defects inevitably introduced in the practical polishing process incur strong thermal absorption for incident lasers, seriously lowering the laser-induced damage threshold (LIDT). Here, we simulate the temperature and thermal stress distributions involved in the laser irradiation process to investigate the effect of impurity defects on laser damage resistance. Then, HF-based etchants (HF:NH4F) are applied to remove the subsurface impurity defects and the surface quality, impurity contents and laser damage resistance of etched silica surfaces are tested. The results indicate that the presence of impurity defects could induce a dramatic rise of local temperature and thermal stress. The maximum temperature and stress can reach up to 7073 K and 8739 MPa, respectively, far higher than the melting point and compressive strength of fused silica, resulting in serious laser damage. The effect of impurity defects on laser damage resistance is dependent on the species, size and spatial location of the defects, and CeO2 defects play a dominant role in lowering the LIDT, followed by Fe and Al defects. CeO2 defects with radius of 0.3 μm, which reside 0.15 μm beneath the surface, are the most dangerous defects for incurring laser damage. By HF acid etching, the negative effect of impurity defects on laser damage resistance could be effectively mitigated. It is validated that with HF acid etching, the number of dangerous CeO2 defects is decreased by more than half, and the LIDT could be improved to 27.1 J/cm2.

In-situ characterization of subsurface microdefects and damage threshold of the fused silica

Research Progress on Subsurface Defects in Fused Silica

Traceless Mitigation of Laser Damage Precursors on a Fused Silica Surface by Combining Reactive Ion Beam Etching with Dynamic Chemical Etching

Effects of Acid-Etching Depth on 355 Nm Laser-Induced Damage Threshold of Fused Silica

Experimental study on HF etching of fused silica

Scratch Types and Damage Thresholds of Fused Silica

Effect of HF etching on the surface quality and laser-induced damage of fused silica

Effect of Different Etching Processes on Surface Defects of Quartz Crystals

Evolution of physical and mechanical properties of fused silica after subsurface damage layer removal by RIE treatment

Experimental investigation and numerical simulation of defect elimination by CO2 laser raster scanning on fused silica

Characterization of artificial indentation defects in fused silica surface and its damage performance under 355 nm nanosecond laser

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

Experimental Study on Evolution of Chemical Structure Defects and Secondary Contaminative Deposition during HF-Based Etching

Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics

Combined Etching Technology for Controlling Surface Damage Precursors to Improve Laser Damage Resistance of Fused Silica

Experiment of Laser Induced Damage Threshold for Different Sub-Surface Cracks on Fused Silica

Analysis and Experimental Investigation of Laser Induced Damage of Optics

Recovery of fused silica surface damage resistance by ion beam etching

Enhancement of laser induced damage threshold of fused silica by acid etching combined with UV laser conditioning

Effect of colloidal silica particles on subsurface damage of fused silica optics during CMP process

A Study on the Surface Quality and Damage Properties of Single-Crystal Silicon Using Different Post-Treatment Processes