Effect of processing parameter on Ti-Al thin sheet deposited by EB-PVD technology

He Xiao-dong
2010-01-01
Abstract:The evaporation and deposition process of Ti-Al thin sheet under actual experiment conditions was analyzed to obtain proper processing parameters of Ti-Al thin sheet prepared by EB-PVD technology.By using thermotics theory with experimental analysis and according to the trait of EB-PVD technology,the transfer of evaporating particles,the effect of saturated vapor pressure on different atoms and the re-evaporation of Al were studied.The results indicate that the optimal source-substrate distance is about 280 mm,and the cross section of deposit presents natural lamination due to the deviation of saturated vapor pressure between Ti and Al element.The addition of Nb tablet on target can reduce component deviation between deposit and target resulted from the diversity of evaporating rate of component.Besides,the effect on deposit by re-evaporation of Al can be neglected.The depositing rate can be increased and the effect of deviation of saturated vapor pressure on the component deviation can be reduced by the proper design for processing parameters and the introduction of Nb into molten pool.
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