Light-induced bipolar-resistance effect based on metal-oxide-semiconductor structures of Ti/SiO(2)/Si.

Chongqi Yu,Hui Wang
DOI: https://doi.org/10.1002/adma.200903070
IF: 29.4
2010-01-01
Advanced Materials
Abstract:A novel approach to the control of resistance in a Ti/SiO2/Si structure is demonstrated by use of a laser via a phenomenon referred to as the bipolar-resistance effect (BRE). The most significant features of this BRE are an excellent spatial sensitivity and a large change ratio in resistance as the laser moves along the surface of the structure.
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