Inhibition of enhanced Cu oxidation on ruthenium

ShaoFeng Ding,Qi Xie,Thomas Waechtler,HaiSheng Lü,Stefan E. Schulz,Xinping Qu
DOI: https://doi.org/10.1109/IITC.2010.5510315
2010-01-01
Abstract:The enhanced oxidation of Cu on Ru/diffusion barriers was observed. The in-situ X-ray diffraction results reveal that the Cu oxidation can be inhibited by doping C in either Ru adhesion layer or TaN barrier layer. The RuC/barrier becomes more robust with certain amount of C doped in Ru. ALD Cu2O on the RuC substrate was carried out and the effect of C on reduction of Cu oxide was observed.
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