Growth and optical properties of transparent CaMoO4 films by chemical solution deposition on Si and glass substrates

Hechang Lei,Xuebin Zhu,Shoubao Zhang,Gang Li-,Xianwu Tang,Wenhai Song,Zhaorong Yang,Jianming Dai,Yuping Sun
DOI: https://doi.org/10.1088/0022-3727/42/4/045404
2009-01-01
Abstract:Nanocrystalline CaMoO4 (CMO) thin films were fabricated on Si and glass substrates via the chemical solution deposition (CSD) method. From x-ray diffraction, atomic force microscopy and Fourier transform infrared spectra results, relatively smooth Scheelite-type CMO thin films can be fabricated within the annealing temperature range from 400 to 700 degrees C. The band gap is 4.18eV calculated from the optical transmission spectra and the photoluminescence (PL) emission spectra show that the CMO thin films on Si have a broad green emission band centred at 490 nm. Our experimental results show that the CSD method is an alternative method to prepare nanocrystalline CMO thin films with a great PL property at low annealing temperatures.
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