Preparation and Characterization of Tio(2)-Hybrid Sio(2) Porous Film

Qiang Liu,Zhong-qi Zhu,Jin Zhang,Qing-ju Liu,Juan Chen
DOI: https://doi.org/10.1109/sopo.2009.5230091
2009-01-01
Abstract:Porous silicon films are currently under intense investigation for optical, photoelectric, thermal and electronic applications. In this work, the silica films have been prepared by a sol-gel process using a CTAB template. As an improvement, TiO2 was doped in silica sol to produce the TiO2-hybrid SiO2 Porous Film, and the hydrophobic activation of the film was carried out. The chemical and physical changes during sol-gel process were analyzed using DSC-TGA and FTIR. The structure and morphology of films were characterized by XRD and AFM. The experimental results show that the fabricated films have a nano-porous structure. The porous silica film (mean pore size 50 nm) is about 500 nm thick. The mechanical reliability of the film is well, and the contact angle of film is above 90deg after hydrophobic activation.
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