EFFECT OF CUSP MAGNETIC FIELD ON SILICON SINGLE CRYSTAL CZ GROWTH PROCESSES

You-Rong LI,Dong-Hai WEI,Shuang-Ying WU,Lan PENG
DOI: https://doi.org/10.3321/j.issn:0253-231X.2008.06.031
2008-01-01
Kung Cheng Je Wu Li Hsueh Pao/Journal of Engineering Thermophysics
Abstract:In order to understand the effects of a cusp magnetic field on the transport phenomena in the Czochralski furnace for the single crystal growth of silicon, a set of global numerical simulations were carried out using the finite-element method for the magnetic field strength from 0 to 2.0 T. The results show that the silicon melt flow is suppressed by the cusp magnetic field. The increase in magnetic field strength depresses the convective heat transfer from the crucible to the crystal, and consequently leads to increase in the heater power, the maximum temperature difference between the crucible wall and crystal-melt interface, and the crystal-melt interface shape less convex towards the melt except when the strength of magnetic field is 0.05 T and 0.1 T. As the melt flow is suppressed, the maximum oxygen concentration increases. The average oxygen concentration along the melt-crystal interface reduces when the strength of magnetic field is less than 1.0 T, and then increases slightly. With the increase of the magnetic field strength, the oxygen motion becomes diffusion-controlled.
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