Spin Valve Effect in the Van Der Waals Heterojunction of Fe3GeTe2/tellurene/Fe3GeTe2
Xiangyu Zeng,Liang Zhang,Yang Zhang,Fazhi Yang,Liqin Zhou,Yong Wang,Cizhe Fang,Xiaoxi Li,Siying Zheng,Yang Liu,Yan Liu,Xiaozhi Wang,Yue Hao,Genquan Han
DOI: https://doi.org/10.1063/5.0215304
IF: 4
2024-01-01
Applied Physics Letters
Abstract:Spintronic devices are regarded as prime candidates for addressing the demands of emergent applications such as in-memory computing and the Internet of Things, characterized by requirements for high speed, low energy consumption, and elevated storage density. Among these, spin valves, serving as fundamental structures of magnetic random-access memory, have garnered substantial attention in recent years. This study introduces an all van der Waals (vdW) heterostructure composed of Fe3GeTe2 (FGT)/tellurene/FGT, wherein a thin layer of Weyl semiconductor Te is interposed between two ferromagnetic FGT layers. The proposed configuration exhibits a characteristic spin valve effect at temperatures below 160 K. This effect is attributed to spin-dependent transport and spin-dependent scattering phenomena occurring at the interfaces of the constituent materials. Furthermore, as temperature decreases, the magnetoresistance ratio (MR) of the device increases, indicative of the heightened polarization ratio of FGT, with an MR of 0.43% achievable as the temperature approaches 5 K. This investigation elucidates the underlying operational mechanisms of two-dimensional spin valve devices and lays the groundwork for the realization of spin-based integrated circuits.