Abstract:In surface coatings technology, especially in carbon-based materials, the deposition of energetic species is acknowledged as one of the most important factors in producing hard coatings. Pulsed laser deposition (PLD) of carbon under vacuum creates such energetic species and so carbon films with very high hardness values have been reported. However, when PLD takes place in a gas ambient, the ablated carbon species are decelerated to an extent that depends on the background pressure. As a result, during CNx deposition, although the carbon species react effectively with N-2 at the beginning of their trajectories, when they reach the substrate they usually do not have sufficient kinetic energy to form a hard coating. In this paper we describe a new technique that combines the intense environment of an expanding N-2 jet with low-pressure PLD to produce CNx species that travel almost free of collisions and reach the substrate with high kinetic energies. This new configuration is based on the synchronised pulsing of a N-2 jet with the laser pulse. The CN films produced are shown to have an increased film hardness without suppressing the nitrogen content. Furthermore, electron energy-loss spectroscopy shows the layers to have a very high proportion of pi bonding, which can be correlated to the existence of sp-hybridised carbon in the form of -C=N bonds. (C) 1998 Elsevier Science S.A. All rights reserved.

Effect of Nitrogen Content on the Microstructure and Properties of Cnx Films Deposited by Pulsed Bias Arc Ion Plating

Microstructure, Mechanical, and Tribological Properties of CN X Thin Films Prepared by Reactive Magnetron Sputtering

Optical & Electronic Properties of Carbon Nitride Thin Films

Ion-beam-assisted Deposition of CNx Films

Effects of Nitrogen Content on Microstructures and Mechanical Behavior of (titacrmonb)nx Films

Preparation and Characterisation of Carbon Nitride Films Deposited by Pulsed Laser Arc Deposition

Investigation of Carbon Nitride Films Deposited by Ion Beam-Assisted Deposition with Low Bombarding Energy of N Ions

Optimizing hardness of CN x thin films by dc magnetron sputtering and a statistical approach

Effect of bombarding energy of N ions on composition, hardness and surface free energy of carbon nitride films

Cn(X) Films Deposited By Laser-Ablation Of Graphite Under Low-Energy Nitrogen-Ion Beam Bombardment

Microstructure and Mechanical Properties of Carbon Nitride Multilayer Films Deposited by DC Magnetron Sputtering

Investigation of carbon nitride films by cathodic arc evaporation

Effects of Nitrogen Content on the Structure and Mechanical Properties of (Al0.5CrFeNiTi0.25)Nx High-Entropy Films by Reactive Sputtering

Correlation Between Structure and Hardness of Magnetron Sputtering Deposited CNx Films

Enhancement of the properties of pulsed laser-deposited carbon nitride by the synchronisation of laser and N2 gas jet pulses

Structural Characterization of Nitrogen Doped Diamond-Like Carbon Films Deposited by Arc Ion Plating

Effects of nitrogen content on structure and mechanical properties of multi-element (AlCrNbSiTiV)N coating

Film Thickness Effects on Mechanical and Tribological Properties of Nitrogenated Diamond-Like Carbon Films

C3N4 Film Deposited by Synchrotron Radiation Assisted CVD

Effects of Nitrogen on Formation and Properties of Diamondlike Films Synthesized by Dual Ion Beam Deposition

Microstructure and Tribological Behavior of BCN Thin Films with Different Nitrogen Contents