Abstract:SiO2-TiO2 planar optical waveguides are fabricated on silicon wafer substrate by dip-coating technique with the Sol-Gel solutions, based on which the stripe optical waveguides are patterned by laser direct writing (LDW) of the Sol-Gel films by the use of a Ytterbium fiber laser and followed by chemical etching. The effects of the laser processing parameters on the microstructure of the core layer films are investigated. The relative chemical etching rates between the laser irradiated area and the non-irradiated area in Sol-Gel films that are heated at different temperature ranges are characterized by checking the thickness of the films. The optical fields and propagation losses of the optical waveguides at the wavelength of 1550 nm are characterized by multi-channel fiber/waveguides coupling system. The experimental results demonstrate that the composition of the sol-gel films, the post heat treatment temperature for the films and laser power density to irradiate the films have a big effect on the widths of the stripe optical waveguides, and the minimum widths about 25 mu m can be fabricated by choosing the suitable parameters above mentioned. It is found that the core layer of the planar optical waveguides as received by Sol-Gel method is loose in structure, and a shrinkage concave groove forms in the laser irradiated area. The microstructure and forming mechanisms of the stripe waveguides by laser direct writing Sol-Gel films are discussed. The minimum propagation loss of the fabricated stripe waveguides is about 1.7 dB/cm. at 1550 nm. Better results are expected by improving the film composition and laser processing parameters further.

Laser direct writing of SiO2/TiO2 sol-gel films to fabricate stripe optical waveguides

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