A SMALL-SIZE ARC-DISCHARGE ION-SOURCE
Antonio Aliano,Giancarlo Cicero,Hossein Nili,Nicolas G. Green,Pablo García-Sánchez,Antonio Ramos,Andreas Lenshof,Thomas Laurell,Aisha Qi,Peggy Chan,Leslie Yeo,James Friend,Mikael Evander,Thomas Laurell,Andreas Lenshof,Thomas Laurell,Jian Chen,Jean Christophe Lacroix,Pascal Martin,Hyacinthe Randriamahazaka,W. Jon. P. Barnes,Bart W. Hoogenboom,Kenji Fukuzawa,Hendrik Hölscher,Alessia Bottos,Elena Astanina,Luca Primo,Federico Bussolino,Xuefeng Gao,Vinh-Nguyen Phan,Nam-Trung Nguyen,Chun Yang,Patrick Abgrall,Friedrich G. Barth,Pablo Gurman,Yitzhak Rosen,Orlando Auciello,C. J. Kähler,C. Cierpka,M. Rossi,Bharat Bhushan,Manuel L. B. Palacio,Charles L. Dezelah
1987-01-01
Abstract:The article describes a small-size are discharge ion source.Some of its basic parametersare measured by combining the arc discharge with the electron oscillation.The ion current is7 mA.It can produce multi-charge ions.The extraction structure is commonly used by thissource and the r.f.ion source.This ion source has been used in a 400 keV ion implanter inBeijing Normal University and it is stable in operation.