Fabrication And Characterization Of Tio2 Antireflection Thin Film Deposited On The Solar Cell

Hequan Wang,Dechun Ba,Hui Shen,Lishi Wen
DOI: https://doi.org/10.1007/978-3-540-75997-3_193
2007-01-01
Abstract:TiO2 thin film has attracted considerable attention in recent years, due to its different refractive index and transparency with amorphous and different crystals in the visible and near-infrared wavelength region, high dielectric constant, wide band gap, high wear resistance and stability, etc, for which make it being used in many fields. This paper aims to investigate the antireflection characterization of TiO2 thin film on silicon solar cell.The TiO2 thin films were prepared by DC reactive magnetron sputtering process from Ti target. The reflectivity of the films were measured by UV-3101PC, the index of refraction (n) and extinction coefficient (k) were measured by n&k Analyzer 1200,and the IN characteristic curves of uncoated and coated solar cell were measured by I-V testing system of solar cell.
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