GaN Layers with Different Polarities Prepared by Radio Frequency Molecular Beam Epitaxy and Characterized by Raman Scattering

Zhong Fei,Li Xin-Hua,Qiu Kai,Yin Zhi-Jun,Ji Chang-Jian,Cao Xian-Cun,Han Qi-Feng,Chen Jia-Rong,Wang Yu-Qi
DOI: https://doi.org/10.1088/1009-1963/16/9/048
2007-01-01
Abstract:GaN layers with different polarities have been prepared by radio-frequency molecular beam epitaxy (RF-MBE) and characterized by Raman scattering. Polarity control are realized by controlling AI/N flux ratio during high temperature AIN buffer growth. The Raman results illustrate that the N-polarity GaN films have frequency shifts at A(1)(LO) mode because of their high carrier density; the forbidden A(1)(TO) mode occurs for mixed-polarity GaN films due to the destroyed translation symmetry by inversion domain boundaries (IDBS); Raman spectra for Ga-polarity GaN films show that they have neither frequency shifts mode nor forbidden mode. These results indicate that Ga-polarity GaN films have a better quality, and they are in good agreement with the results obtained from the room temperature Hall mobility. The best values of Ga-polarity GaN films are 1042 cm(2) /VS with a carrier density of 1.0 X 10(17) cm(-3).
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