Structural Properties Of Znte Epilayers Grown On (0001)Alpha-Al2o3 Substrates By Metalorganic Vapor Phase Epitaxy

Qixin Guo,Yusuke Kume,Jiajun Gu,Di Zhang,Tooru Tanaka,Mitsuhiro Nishio,Hiroshi Ogawa
DOI: https://doi.org/10.1143/JJAP.46.7221
2007-01-01
Abstract:ZnTe layers have been grown on (0001) sapphire (alpha-Al2O3) substrates by metalorganic vapor phase epitaxy using dimethylzinc and diethyltelluride as the source materials. The structural properties of the ZnTe layers are investigated by Xray diffraction and reflection high-energy electron diffraction analyses. It is revealed that (111) ZnTe single-crystalline layers can be obtained on (0001) alpha-Al2O3 substrates at a substrate temperature above 410 degrees C. The X-ray rocking curve measurements confirm that the crystalline quality of the ZnTe layers depends strongly on the substrate temperature, and the best crystalline quality ZnTe layer is obtained at a substrate temperature of 430 degrees C.
What problem does this paper attempt to address?