Effect of pulsed bias on the properties of amorphous titanium dioxide films by arc ion plating

Min Zhang,Guoqiang Lin,Chuang Dong,Lishi Wen

DOI: https://doi.org/10.3321/j.issn:1002-185x.2007.11.007

2007-01-01

Rare Metal Materials and Engineering

Abstract:Uniform and transparent titanium dioxide films have been deposited on glass substrate by pulsed bias arc ion plating. The effect of pulsed bias on the film properties is investigated by varying the substrate bias from 0 similar to 900 V. The results show that the deposited films are amorphous. Pulsed bias has an obvious effect on the film properties. With the increase of the bias, the film's thickness, hardness and elastic modulus change in similar trends. All of them first rise, and then decline. The peak of the film thickness appears in the bias range from -100 V to -200 V, and the peak of the film hardness and elastic modulus appear in the bias rage from -150 V to -250 V. The maximum peak of the film hardness appears at -300 V. The film deposited at -300 V has atomic size smooth surface, R-RMS=0.113 nm, and the highest refractive index, at lambda(n)=550 nm is 2.51, At the bias, the film has the comprehensive properties. The mechanism of the bias effect on film properties is also discussed.