Damages to Optical Silica Glass: Processes and Mechanisms

Sheng-Nian Luo,Lianqing Zheng,Qi An,Heng-An Wu,Kaiwen Xia,Sidao Ni
DOI: https://doi.org/10.1117/12.694797
2007-01-01
Abstract:We present recent results of molecular dynamics simulations to illustrate the processes and mechanisms in damages to silica glass, including densification, cavitation, fragmentation and agglomeration via photon, electron, ion and neutron radiations and stresses. Radiation of glass creates point defects (vacancies and interstitials), and subsequent structure relaxation induces densification. Nanovoid below a certain size and rapid-quenching of silica liquid can also densify a glass. Hot spots due to photon-absorbing impurities in glass may cause local densification and cavitation as well. Densification can also be induced by compressional stress, and spall, by tensile stress. The densified glasses, regardless of the exact processes, share similar structural and vibrational properties, for example, the five-fold coordinated Si atoms. Densification is essentially a kinetic frustration during structure relaxation driven by excessive free energy, e.g., due to defects or stresses. The point-defect mechanism is dominant for densification without compression and complemented by thermal spike mechanism in thermal processes. Defects, thermal effects and stresses may interplay in a general damage process in silica glass.
What problem does this paper attempt to address?