Realizing High Breakdown Voltage SJ-LDMOS on Bulk Silicon Using a Partial N-Buried Layer

Chen Wanjun,Zhang Bo,Li Zhaoji
DOI: https://doi.org/10.3969/j.issn.1674-4926.2007.03.008
2007-01-01
Journal of Semiconductors
Abstract:A new design concept is proposed to eliminate the substrate-assisted depletion effect that significantly degrades the breakdown voltage (BV) of conventional super junction-LDMOS.The key feature of the new concept is that a partial buried layer is implemented which compensates for the charge interaction between the p-substrate and SJ region,realizing high breakdown voltage and low on-resistance.Numerical simulation results indicate that the proposed device features high breakdown voltage,low on-resistance,and reduced sensitivity to doping imbalance in the pillars.In addition,the proposed device is compatible with smart power technology.
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