Influence of Etching on the Luminescence Characteristic of Strained InAsP/InGaAsP Multiple Quantum Wells

Cao Meng,Wu Huizhen,Lao Yanfeng,Liu Cheng,Xie Zhengsheng,Cao Chunfang
DOI: https://doi.org/10.3969/j.issn.1674-4926.2007.z1.119
2007-01-01
Chinese Journal of Semiconductors
Abstract:To investigate the influence of dry etching on the luminescence characteristic of strained multiple quantum wells, InAsP/InGaAsP multiple quantum wells are grown using gas source molecular epitaxy (GSMBE). It was found that after dry etching a certain depth of the cap layer of the multiple quantum well structure,the PL intensity of the quantum well is enhanced greatly. It was caused by rough surface and microstructure change after dry etching.
What problem does this paper attempt to address?