Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition

Kailun Yao,Jianwan Zheng,Zuli Liu,Lihui Jia

DOI: https://doi.org/10.1088/1009-0630/9/4/11

2007-01-01

Abstract:In this paper,the characterization of thin films,deposited with the precursor fer-rocene（FcH）by the plasma enhanced chemical vapour deposition（PECVD）technique,was in-vestigated.The films were measured by Scanning Electronic Microscopy（SEM）,Atomic ForceMicroscopy（AFM）,Electron Spectroscopy for Chemical Analysis（ESCA）,and SuperconductingQuantum Interference Device（SQUID）.It was observed that the film’s layer is homogeneous inthickness and has a dense morphology without cracks.The surface roughness is about 36 nm.Fromthe results of ESCA,it can be inferred that the film mainly contains the compound FeOOH,andcarbon is combined with oxygen in different forms under different supply-powers.The hysteresisloops indicate that the film is of soft magnetism.