Microwave Ion Source with Permanent Magnet for 100 Kev Ion Implantation

Jianchuan Ming,Qiqian Guo,Jinhui Wang,Weijiang Zhao,Yulan Bai,Qiliang Zhu,Jia Ding
DOI: https://doi.org/10.1063/1.2163849
2006-01-01
Abstract:An electron cyclotron resonance ion source has been developed in RIAMB for 100 keV ion implantation. Its magnetic field was produced by NdFeB permanent magnet and its outline dimension is about 160 mm in diameter and 150 mm in height. It operates in pulse mode, at nitrogen discharge, 100 kV extraction voltages, and 60 kV acceleration voltages; more than 40 mA ion pulse current was extracted from seven emission apertures of 3.5 mm in diameter. Even ion beam over an area of about 250 mm in diameter has been obtained on the sample stage at a distance about 1000 mm from the emission aperture.
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