Investigation on a compact cavity-type microwave ion source

Liqun Shi,Zengliang Yu,Huiyun Feng,Shixiang Peng,Chundong Hu
1997-01-01
Abstract:A small cavity-type microwave ion source used in the device of ion beam cell etching has been fabricated, which consists of a quartz discharge tube, a coaxial cavity and a two-grid extractor enclosing one end of tube. The plasma column of the source was sustained by surface wave excited by the cavity. In order to increase ion current extracted from the end of the column, a straight tube with inner diameter of �� 7.0 mm and the same straight tube inserted by a liner tube with inner diameter of �� 5.0mm at one end, has been operated. For nitrogen, ion current density of 48.4 mA/cm2 and 91.7 mA/cm2 have been extracted from sources respectively, when they are operated at a frequency of 2.45 GHz and a incident power of 93W. This plasma source is of many advantages, such as small volume, simple configuration and high density of ionized electron in the plasma with good stability and reproductivity over a large pressure range, etc.
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