Simulation and Design of New Microwae Plasma Source with Slotted Straight Waveguides

Qing Zhang,Guixin Zhang,Shumin Wang,Liming Wang
DOI: https://doi.org/10.1109/plasma.2009.5227706
2009-01-01
Abstract:Summary form only given. A new high efficiency and large volume microwave plasma source has been developed. The microwave plasma source consists of a 1-10 kW 2.45 GHz magnetron power supply, microwave transmission and monitoring system, microwave power splitter, adjustable short-circuit plunger and two parallel straight waveguide components with slots on its inner sides. Microwave electromagnetic energy is coupled from the parallel rectangular waveguides through regularly positioned slots into the plasma rectangular chamber of 460 mm in length, 64 mm in width and 118 mm in height, shaped by a quartz glass cube to enclose the space of work gas. The location and size and direction of slots and the distance between the two parallel metal waveguides were determined by the electromagnetic numerical simulation. The design parameters of the microwave plasma source were optimized to produce high-amplitude and uniform electromagnetic field distribution. The calculated fields distribution fit perfectly to those measured inside the plasma chamber without plasma. The stable microwave plasma of different gases (He, Ar) at atmospheric pressure is produced at low-power inside the entire quartz glass cube. The operational characteristics of microwave plasma source in different experimental condition is discussed. This microwave plasma source has a significant characteristic of the modular structure design, which facilitates the three-dimensional scale-up of the source by series-parallel connection. The potential industrial applications of this microwave plasma source are for material synthesis and sterilization.
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