Preparation of ZnMnO by ion implantation and its spectral characterization

Zhong Hong-Mei,Chen Xiao-Shuang,Wang Jin-Bin,Xia Chang-Sheng,Wang Shao-Wei,Li Zhi-Feng,Xu Wen-Lan,Wei Lü,HM Zhong,XS Chen,JB Wang,CS Xia,SW Wang,ZF Li,WL Xu
DOI: https://doi.org/10.7498/aps.55.2073
IF: 0.906
2006-01-01
Acta Physica Sinica
Abstract:This paper reports the fabrication of ZnMnO semiconductor by high-dose Mn implantion. We studied the influence of implantation dose and annealing on its optical properties. The broad band at 575 cm(-1) in Raman spectrum is attributed to defects related to high-dose Mn implantion. The vibration modes at 528 cm(-1) are considered to be associated with Mn impurities. Room temperature photoluminescence spectra show that the high-dose Mn implantion can enhance the intensity in visible band.
What problem does this paper attempt to address?