Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Silicon Nanostructures Formed by Self-Organizing Au Nanoparticle Film

Silicon nanotips formed by self-assembled Au nanoparticle mask

Fabrication of Nanostructures on Si Surface Using Gold Nanoparticle Mask

FABRICATION OF SILICON NANOARRAYS BY DIRECT NANOSPHERE LITHOGRAPHY

Unconventional Lithography for Patterned Nanomaterials

Controllable and Facile Fabrication of Gold Nanostructures for Selective Metal-Assisted Etching of Silicon

Nanopatterned Assembling of Colloidal Gold Nanoparticles on Silicon

Evaporation-Induced Self-Assembly of Gold Nanoparticles into A Highly Organized Two-Dimensional Array

Reorganization of Gold Nanoprticles in Self-Assembled Nanostructures

Spatial patterning of colloidal nanoparticle-based thin film by a combinative technique of layer-by-layer self-assembly and lithography

Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography

Site-Selective Assemblies of Gold Nanoparticles on an AFM Tip-Defined Silicon Template

Large-Scale Assembly of Colloidal Nanoparticles and Fabrication of Periodic Subwavelength Structures

Gold Nanoparticle Patterning of Silicon Wafers Using Chemical E-Beam Lithography.

Fabrication Method of Silicon Nanostructures by Anisotropic Etching

Fabrication of Metal Suspending Nanostructures by Nanoimprint Lithography (NIL) and Isotropic Reactive Ion Etching (RIE)

Preparation of Silicon Nanopillars Array Using Gold Nanoparticles As Etching Mask

Large-scale Patterning of Hydrophobic Silicon Nanostructure Arrays Fabricated by Dual Lithography and Deep Reactive Ion Etching

Periodic Silicon Nanocones Arrays with Controllable Dimensions Prepared by Two-Step Etching Using Nanosphere Lithography and NH4OH/H2O2 Solution

Size and Morphology Control of Highly-Ordered Nano-Silicon Pillar Fabricated by Direct Nanosphere Lithography

Colloidal monolayer at the air/water interface: Large-area self-assembly and in-situ annealing