Constraints and Resolution for Phase Change Materials and Memory Device Scaling

Hong Yang,Lin Yinyin,Ling Yun,Lai Lianzhang,Feng Jie,Lai Yunfeng,Qiao Baowei,Tang Tingao,Cai Bingchu,Chen Bomy
DOI: https://doi.org/10.1080/10584580600660223
2006-01-01
Integrated Ferroelectrics
Abstract:The electrical properties, especially the resistance of GST resistor for PRAM (Phase-change RAM) application, are investigated when its size downscales to 10 or 20 nm. It is shown the downscaling of the phase-change materials to nanometer leads to increasing resistance. However, for PRAM arrays, process variation and increasing sub-threshold leakage current of access transistor (AT) together with other factors such as complex peripheral circuits come unsolved before PRAM can be widely used. Herein experimental and theoretical results show that there is no limit to downscaling before 45 nm node with many solutions being able to extend this trend.
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