Optical emission spectroscopy during diamond-like carbon films deposition process by ICPECVD

Shiji YU,Jialiang ZHANG,Zhenfeng DING,Tengcai MA
DOI: https://doi.org/10.3321/j.issn:0253-3219.2006.02.019
2006-01-01
Abstract:Diamond-like carbon (DLC) films were prepared by inductively coupled plasma enhance chemical vapor deposition (ICPECVD). Optical emission spectroscopy (OES) was applied to the analysis of different radicals in the process. The deposition rate and microhardness of DLC films were tested. The result shows that more ionic hydrocarbon radicals exist in methane plasma which is excitated by inductively coupled plasma source, so the hard DLC films are formed. Both RF power and pressure have distinct influence on radical's species and proportion in the DLC films deposition process, and the film's quality is affected finally.
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